CNTs growth for field emission display device
Special Features
Small thermal CVD system for carbon nano tube synthesis.
Economical R&D system for CNTs synthesis,
Uniform heating zone,
Specifications
Heating range : 500 ~ 950°C
Average throughput : Up to 15,000 wafers per year
Wafer capacity : 3 × 2"
Dimension : 1,500L × 1,450H × 700W (mm3)
Power: 220V/380V, 3phase, 19kW
Gas : NH3/C2H2(C2H4, CH4, CO)/Ar
Furnace heater : nichrome(heating rate: 30°C/min, max. temp.: 950°C, deviation: ±5°C)
Pump : Rotary(600l/min)
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