"Something Different! So Different!"SiH2Cl2 Dichlorosilane
? Application
-SiH2Cl2 is silicon precursor gas used in combination with ammonia for silicon nitride chemical vapor deposition (CVD). SiH2Cl2 is also used for epitaxial silicon deposition.
? Specification
Specification
Analyzer
Purity
SiH2Cl2
99.9%
Impurity(ppmv)
O2 + Ar
= 1.0
GC
N2
= 1.0
GC
CO
= 1.0
GC
CO2
= 1.0
GC
CH4
= 1.0
GC
HC
= 10.0
GC
SiH3Cl
= 500
GC
SiHCl3
= 500
GC
SiCl4
= 500
GC
? Package
Type
Material
Filling Weight (Max.)
Valve Connection Type
40L
SUS 316L
37kg
JIS 22-14LDISS 636
10L
SUS 316L
9kg
SiH2Cl2 Dichlorosilane
Description
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- Note: This is a Catalog Produt.
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