"something different! so different!"NF3 Nitrogen Trifluoride
? Application
- Used for cleaning CVD Chamber or etching vapor deposition layer(film) during the production process of semiconductor, TFT-LCD and solar cell.
? Specification
Item
Specification
Purity
NF3
99.999%
Impurity(ppmv)
O2 + Ar
< 1.0
N2
< 1.0
CF4
< 10.0
CO2
< 1.0
N2O
< 1.0
SF6
< 1.0
CO
< 1.0
HF
< 1.0
H2O
< 1.0
? Package
Type
Material
Filling Weight (Max.)
Valve Connection Type
47L
Mn Steel
22.7Kg
DISS 640,CGA 330,JIS 22R/L
Bundle
500Kg
DISS 640
Ton-Cylinder
Cr-Mo Steel
200Kg
ISO Container
4,200Kg/8,000Kg
NF3 Nitrogen Trifluoride
Description
Product Inquiry
Purchase Product Catalog
Payment & Shipping Conditions:
- Payment: We accept payment through Paypal Only.
- Shipping: We will ship the catalog once the payment is received. And you will be receiving the catalog with in 10 -14 busines days. Shipping might be delayed in due to international shipping conditions which is depends on the countries receiveing. In case hard copy of catalog is not available then we will ship the soft copy.
- Refund: We can refund the order before shipping process was initiated. Incase Catalog not available, we will make sure to refund the order.
- Note: This is a Catalog Produt.
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