R&D Total Solution for Solar Application Manufacturers,R&D Total Solution for Solar Application Suppliers

Description

Features Plasma Enhanced CVD is an excellent alternative for depositing a variety of thin films at lower temperature than those utilized in CVD reactors without setting for a lesser film quality. PECVD uses electrical energy to generate a glow Discharge(Plasma) in which the energy is transferred into a gas Mixture. Some of the desirable properties of PECVD films are good adhesion, low pinhole density, Good step coverage, and uniformity. Specifications Sample Size : 150mm x 150mm Power Source : RF 13.56MHz, VHF 60MHz Deposition Type : PECVD, VHFCVD Plasma Type : Direct Plasma Substrate Temperature : Max. 450°C Temperature Uniformity : ± 3°C High Vacuum Pumping(Rotary + TMP + Booster) Ultimate Pressure : 5 x 10-6 torr within 60min Full Automation Control System Using PC Interface

Product Inquiry

Your Name:
Your E-Mail:
Telephone Number:
Fax Number:
Your Country & Territory:
Address:
Subject:
Product Quantity Looking for:
Your Message:	Note: Please clealry menction the product/product names, Model, Size & other specifications that will help us to reply you as soon as possible.
Additional Details Required:	Minimum Order Quantity Payment Terms More Product Details Availability / Cost Shipping Details Certificates Expected Delivery Lead Time
Confirm Text:

Purchase Product Catalog

Payment & Shipping Conditions:

Payment: We accept payment through Paypal Only.
Shipping: We will ship the catalog once the payment is received. And you will be receiving the catalog with in 10 -14 busines days. Shipping might be delayed in due to international shipping conditions which is depends on the countries receiveing. In case hard copy of catalog is not available then we will ship the soft copy.
Refund: We can refund the order before shipping process was initiated. Incase Catalog not available, we will make sure to refund the order.
Note: This is a Catalog Produt.