Features
BCS5000 Plasma enhanced CVD system is batch-production equipment.That supports the application of silicon based thin film process of fearing step coverage and gap filling required during semiconductor fabrication and solar cell device processes, Including the applications of passivisation, isolation and dielectric insulation depositions.
Application
A-Si, Sio2, Si3N4 Deposition
Passivisation, isolation
Solar Cell Device
Specification
Sample Size : 156mm x 156mm x 4PCS
Power Source : RF 13.56MHz
Deposition Type : PECVD
Plasma Type : Direct Plasma
Substrate Temperature : Max. 450°C
Working Pressure : 30m Torr ~ 5Torr
Film Thickness Uniformity : ±2.5%
Film Thickness Uniformity Wafer to wafer : ±2.5%
Refractive Index : 1.9 ~ 2.3
Pump Station : Booster + Rotary pump
PE-CVD for Silicon Wafer Solar Cell
Description
Product Inquiry
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Payment & Shipping Conditions:
- Payment: We accept payment through Paypal Only.
- Shipping: We will ship the catalog once the payment is received. And you will be receiving the catalog with in 10 -14 busines days. Shipping might be delayed in due to international shipping conditions which is depends on the countries receiveing. In case hard copy of catalog is not available then we will ship the soft copy.
- Refund: We can refund the order before shipping process was initiated. Incase Catalog not available, we will make sure to refund the order.
- Note: This is a Catalog Produt.
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