Standard Asher. RIE System Manufacturers,Standard Asher. RIE System Suppliers

Description

Features - Reactive Ion etching(RIE) is an etching technology used in micro fabrication.- It uses chemically reactive plasma to remove material deposited on wafers.- High0energy ions from the plasma attack the wafer surface and react with it. Application Silicon etching Dielectrics etching(SiO2, Si3N4, etc) Polyamide etching Specifications Substrate Size : Piece to 6inch Max. Temperature : 700°C (On Heater) Process Gases Nozzle & RF Plasma Source Effective Area : 6inch RF Power Supply : 13.56MHz, 600W Gas Flow System -Flow Control Range : 0~100 scum-Gas : Ar, O2, SF6, CHF3(4Channel + Option)-Gas Panel in Jungle Box All System Control using PLC Based Touch Panel(TFT 256Color) Ultimate Pressure : <1 x 10-6 Torre within 10 min.

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