Rapid Thermal Anneal

Rapid Thermal Anneal

Rapid Thermal Anneal Made in Korea

Description

 Speccification- Hardware Performance -   1-1 MTBF: > 500 Hours   1-2 MTTR: > 2 Hours   1-3 Up-Time: 95%   1-4 Through-put: 70Wafer(2Chamber)   1-5 Oxidant Control: min 3.0ppm   1-6 particle: < 0.04/?, 0.16?     - Reactor Chamber -   2-1 Max Temperature: 1250?   2-2 Temperature Ramp-Up rate: 30~120?/sec   2-3 Temperature Down rate: 10~50/sec   2-4 Temperature Repeatability: < ± 2.0?   2-5 Temperature Control Range: 400~1200?   2-6 Source Life Time: > 1000Hrs   - Heating Pervformance -   3-1 Lamp Type: Circular Type   3-2 Temperature Control Method: Open/Close Loop(9Zone)   3-3 Temperature Uniformity: < ± 20.?(at 1000?)     - Process gas supply system -   4-1 Accuracy of flow rate: set flow < ± 10.?%   4-2 Gas distribution box: 3Gas Channel(Ar,PN2, O2)     - Applicatiion Process -   5-1 IMP Anneal: OK(Rs Uniformity: < 1.0%)   5-2 BPSG Reflow: OK   5-3 Barrier Metal Anneal: OK

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