Acesol® slurries offer a complete solution for your polishing requirements based on the latest colloidal silica technology showing exceptional stability and high manufacturing reproducibility.
ACESOL -series Colloidal Silica CMP Slurry WP 2010
?Non-agglomerating slurries with tight Particle distributions
?Enables high removal rates
?Low solid contents, excellent uniformity, no defect
?Products development for customized applications
?Individual, non-setting spherical particles
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