Vacuum In-Line Sputtering System

Vacuum In-Line Sputtering System

Vacuum In-Line Sputtering System Made in Korea

Description

The Sputtering System consists of a chamber made of SUS 304, mounted on a frame, pumping system, magnetron sputtering system substrate heating system, gas system, control system. Chamber has rectangular shape. it is made of 304 stainless steel Chamber has a door in front, substrate transport system, heating zone and sputterig zone(zones) Pumping System can be based on diffusion pump or on turbo-, or cryo-pumps in accordance with customer requirements. Magnetron Sputter method can be based on a single DC sputter, or dual pulsed sputter process (for oxide materials). target size can vary from 250 mm length up to 1600 mm length. Gas Control System Substrate Heater provides heating of a substrate prior to coating Heating element : sheathed heater Control System Power Supply in dependence of customer's requirements. can be DC, or RF, or pulsed (UNI of BIPOLAR).

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