It is an equipment automatically cleaning and drying photo mask for wafer. STANDARD Model(ST Model) and NON-SCRUB model(NS Model) are available.
Constitution of Standard Model
1st block : Loader, Chuck Rinse Bath, H2SO4 Bath, QDR1, QDR2.
2nd block : Scrubbing Station.
3rd Block : Chuck Rinse Bath, SC-1/Megasonic Bath, QDR3, Overflow Bath.
4th block : IPA Dryer, Unloader
Constitution of Non-Scrub model #An equipment of which 2nd block is eliminated.
Constitution of equipment process flow. Heating up 1st block. Eliminate organic matters...