OZONE - Plasma Enhanced Atomic Layer Depos...

OZONE delivers monolayer precision, critical for leading edge deposition. It offers a cutting edge solution. Application Dielectric layers(High K) and conductive electrodes for transistor gate and memory cell, passivation and diffusion barrier, seed layers(metal liners) and conductive layers for IC interconnection Technology In-situ cleaning Impurity, pin hole free film deposition Excellent step coverage Dense, homogene, uniform, stoichiometric films Uniquely designed shower head and reactor for gas phasereaction free Specification Al6061-T6 chamber system Reactor for up to 300mm single wafer deposition Rotary vane pump & booster pump of low vacuum pumping systems Up stream or down stream auto pressure control Particle trap heating up to 600 °C Plasma source and 13.56MHz auto matching box 1 purge gas line, 3 reactive gas line and 3 organic liquid source line IPC-control including Windows user interface for fully automatic process control