"something different! so different!"NF3 Nitrogen Trifluoride
? Application
- Used for cleaning CVD Chamber or etching vapor deposition layer(film) during the production process of semiconductor, TFT-LCD and solar cell.
? Specification
Item
Specification
Purity
NF3
99.999%
Impurity(ppmv)
O2 + Ar
< 1.0
N2
< 1.0
CF4
< 10.0
CO2
< 1.0
N2O
< 1.0
SF6
< 1.0
CO
< 1.0
HF
< 1.0
H2O
< 1.0
? Package
Type
Material
Filling Weight (Max.)
Valve Connection...