Application
Diffusion / Oxidation(Wet/Dry) / Annealing / Alloy / LPCVD
Features
Mini Batch Type Vertical Furnace
Vertical Furnace for 100~300mm wafers
2 I/O Port
Boat Rotation Available
PFlexibility for S/W upgrade
Specification
Parameters
Unit
Specifications
Wafer size
mm
150 ~ 300
Maximum Temp Zone
°C
1200
Constant Temp Zone
mm
> 500
Temp Uniformity
°C
< ±0.5
Wafer Pitch
mm
6.35 [5.2~9]
Batch Size
#of wfs
50[max 75]
Throughput [4hr Process]
#of wfs/mo...