Plasma surface treatment of various materials PECVD process
Special Features
Batch type of NPPN system for a large area surface treatment(1,000phi x 2,000H).
Plasma nitriding system minimizing ion bombardment using a mesh type of cathode.
Automatically control with PC interface.
Convenient sample loading with sample tray.
Average throughput Up to 120 ton per year.
Specifications
Dimension : 2,870L X 3,411H X 2,400W (mm3)
Power : DC 30kW
Heater : 2phi, inconel heater
Gas : N2/Ar/CH4/H2/TMS/CxHX
Pump : Rotary(3,500 l/min) & Booster(1,200 l/min)
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