Plasma surface treatment of various materials PECVD process
Special Features
Batch type of NPPN(New Post Plasma Nitriding) system for a large area surface treatment(1,000phi x 2,000H)
Plasma nitriding system minimizing ion bombardment using a mesh type of cathode
Automatically controlled with PC interface
Convenient sample loading with sample tray
Average throughput : Up to 30,000 sheets per year
Specifications
Dimension : 3,000L X 2,000H X 1,000W (mm3)
Power : DC 30kW
Heater : 2phi, inconel wire
Gas : N2/Ar/CH4
Pump : Rotary(1,000 l/min) & Booster(1,200 l/min)
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