Display materials purification
differential evaporation of organic materials
Special Features
Vacuum furnace with four heating zones
Easily movable on rails
Quartz tube conveniently exchangeable
Plug system movable in x, y, z direction
Process range : 400 ~ 900°C
Operated by PLC touch screen
Average throughput : Up to 30,000 wafers per year
Specifications
Wafer capacity : 100 × 8"
Dimension : 2,500L × 1,500H × 6,00W (mm3)
Power : AC 220V, 2 phase
Gas : N2/Ar
Heater : KT APM molding heater (kanthal)(heating rate: 10°C/min, max. temp.:1000°C, deviation: negligible)
Pump: rotary(600 l/min) & turbo(350 l/s)
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