Metal, oxide, magnetic materials etching
Special Features
Inductively-Coupled ICP-CVD system with loadlock chamber for R&D and small Scale production.
Automatic robot transporting system.
Specifications
Dimension : 1,370L × 1,970.2H × 931W (mm3)
Wafer capacity : 1 × 4", 1 × 6"
Heater : 6", -60°C LN2 Cooling
Exhaust : Wet Scrubber 1,200SLM
Gas Cabinet : 2set
Power : AC 2kW (13.56MHz)
Gas : CHF3/O2/CL2/SF6/Ar
Pump : Dry(1,200 l/min & 200 l/min) & TMP(1,000 l/sec)
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