Coatings for PDP electrode protection(eg. MgO etc.)
Special Features
In-line system with 4 arc guns for dielectric materials deposition on 70 inch glass(base pressure: 1 X 10-6 Torr).
Equiped with mechanical, booster and cryogenic pumping system.
Automatically controlled in substrate moving.
Average throughput : Up to 30,000 sheets per year.
Specifications
Dimension : 3,000L X 2,000H X 1,000W (mm3)
Power : 4 power supplies for arc deposition(DC 200A/100V )
6 heaters for substrate heating(DC 35A/220V )
Heater : nichrome(heating rate: 50°C/min, max. temp.: 450°C,
temp. deviation : negligible
Gas : Ar / O2
Pump : rotary(1,000l/min) & booster(3,500l/min) & cryogenic(3,000l/s)
Share In-line Cathodic Vacuum Arc Deposition System in Social Media