Magnetron Sputter System with 4x6 Manufacturers,Magnetron Sputter System with 4x6 Suppliers

Description

Optical device

Passivation layer

Constantan materials

Special Features

4x6" sputter system for R&D and small scale production.

Excellent thickness uniformity(below +-2.8% for the layer of 228.6 nm in thickness).

Highly smooth surface(RMS roughness of deposited layer: 25 Å).

RF/DC magnetron sputter.

Automatic loading system.

Average throughput Up to 100,000 wafers per year.

Specifications

Wafer capacity : 20 x 4"

Dimension : 1575L X 1269H X 930W (mm3)

Power: AC 1.2kW for sputter source

AC 600W for substrate bias voltage(13.56MHz)

Gas : Ar / O2 / H2

Pump : rotary(980l/min) & turbo(1000l/s)

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