Cluster Multi Sputtering System Manufacturers,Cluster Multi Sputtering System Suppliers

Description

Features CSS5000 is industrial equipment for MEMS Device. CSS5000 System is comprised of cluster type Chambers Load Lock, Unload Lock, Trans Module, 3 Process Module Application Metal & Oxide Coating Multi layer coating MEMS Application Specifications Sample Size : 4.75 ~ 12.5inch Process Chamber : 3set Vacuum pumping system : (Rotary + TMP, etch process chamber) Magnetron sputter source : 16inch Sputter Gun x 3ea Sample Rotation : Rotation only Sample Heating Source L Circular 12.5inch Thermocouple + Pyrometer(1set) Sample sub-sector : 4.75, 6, 6.5, 7, 8, 12.5inch x 3set Gas Supply System : Ar, O2 x 3set Power supply : DC, Pulsed DC or RF Power(Option) Film Uniformity : <±5% for WIW, WTW and RTR Full Automation Control System using PC Interface

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