PECVD System for Solar Cell AR Coatings Manufacturers,PECVD System for Solar Cell AR Coatings Suppliers

Description

SiNx dielectric material coating

SiOx dielectric material coating

SiOxNy dielectric material coating

Special Features

Capacitively-Coupled PECVD system with loadlock chamber for R&D and small scale production.

Automatic loadlock system with cassette.

Uniform gas distribution through shower head.

Specifications

Substrate temperature uniformity : (<,=)±2°C @400°C within 6"

Thickness uniformity of deposited layers : <±2% @100nm within 6" (5mm edge exclusion)

Cycle time : <15mins

Average throughput : Up to 21,600 wafers per year

Dimension : 1,730L × 1,027H × 1,832W (mm3)

Power : AC 2kW (13.56MHz) VHF & MF Power compatible

Gas : NF3/O2/H2/SiH4/N2/NH3/N2O/Ar

Substrate material : Si wafer

Pump : Dry(1,200l/min & 200l/min) & turbo(600l/s)

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