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PROCESS OF PRODUCTION AND CHARACTERISTIC
Fused Silica is made from high purity silica, using unique fusion technology to ensure the highest quality. Our Fused Silica is over 99% amorphous and has an extremely low coefficient of thermal expansion and high resistance to thermal shock. Fused Silica is inert, has excellent chemical stability, and has
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* Material : Tosoh quartz, Shin Etsu, GE quartz, Heraeus
* Quartz glass for semiconductor and LCD applications.
* Custom made products ( any shape and size ) Ring, Disc, Flange disc, Plate and Tube ect.
* Large size quartz plate, disc, tube and ring for semiconductor application.
( Maximum size 1500
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Fused Silica
Product Features
-Used for nozzle of Fireproof materials -Amorphous Silica with white color -Low Coefficient of Thermal Expansion -Melted over 2000°C -Can be manufactured independently
Additional Information
Fused Silica
Molecular formula
SiO2
Molecular
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Boron Carbide(B4C)
Additional Information
* Structural formula & chemical formula
B4C
Molecular weight: 55.25
Density : 2.51
Melting Point: 2,450 °C
Main Application: atomic reactor, grinder, boronization of metal
The physical property- splitting shape with black color high hardness next to
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VACUUM EVAPORATION MATERIALS
Additional Information
* VACUUM EVAPORATION MATERIALS * Optical Reflecting Film
Optical Reflecting Filmapplications - reflecting mirror of oscillator in Laser, reflecting mirror of facsimile reflecting mirror of duplicate Able to increase reflection ratio (>98% )by prevent optical