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X-ray mirror
Neutron mirror
Reflective optics for EUV lithography
Special Features
Ion beam sputtering system for precision optics.
Layer deposition and deposited layer milling, sequentially processed, with two ion guns.
Substrate rotation for uniform deposition.
Automatic distance control between ion guns and substrate.
Target rotated
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Specifications
System Size : 2,200mm(W)x950mm(D)x1,800mm(H)
Sample Size : Resolution : 30k
Control Panel : Raith Lithography Module
Probe Current : 1pA - 15nA
Acceleration Voltage : 30kV
Emitter : Ga Liquid metal ion source
Gas Injection System : Up to two different precursors
Stage : 5-axis stage
Detector : Everhart Thomley type SE
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Hard coating
Tribological coating
Optical coating
Special Features
Ion-assisted unbalanced magnetron sputtering system for DLC deposition.
Highly charged partices with a high kinetic energy.
High degree of flexibility for various substrate materials.
Average throughput : Up to 720,000 pcs per year
Specifications
Loading capacity :