Machinery, Industrial Parts & Tools HomeProductsMachinery, Industrial Parts & Tools Inquiry Save to Favorites GO :::::Sort::::: Name Date Added Popular ↑ ↓ PECVD-PVD Cluster System for Graphene Synthesis Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis. Special Features Multi-functional cluster system combined with PECVD, sputter and E-beam evaporation for high quality graphene synthesis. Maximum substrate heater temperature: 1,000°C for PECVD, 800°C for Sputter and 500°C for e-beam evaporation, respectively. Automatic loading transfer chamber around which PECVD, Sputter and E-beam evaporation chambers are attached. PC controled system : recipe save, open function, and fully automation except for e-beam... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea Thermal CVD System for Uniform SiC coating SiC coating, CNTs growth Normal CVD process Special Features Thermal CVD system for SiC coating with MTS bubbler system. PC control based on PLC. Convenient Al2O3 tube setup. Ion exchange type scrubber for SiH4 and Cl gases. High sensitivity gas detectors for H2, Cl, C3H8. Uniform 3 heating zone. Specifications Heating range ~ 1200°C Specifications Average throughput : Up to 20,000 wafers per year Dimension : 1,558L × 1,520H × 800W (mm3) Power: 220V, 100A Gas : H2/C3H8/Ar/MTS (99%) Furnace heater : kanthal A1(heating rate: 30°C/min, max. temp.: 1,400°C, deviation:... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Thermal CVD Made in Korea CVD Made in Korea Sputter Made in Korea Cluster System for PECVD Silicon Layer Optical devices Barrier layer Solar cell Special Features High density PECVD system for a-Si:H and nc-Si:H layer. Low temperature deposition of a-Si:H layer(under about 300°C). Robot transporting system. Specifications Wafer capacity : 1 × 4" Average throughput : Up to 5,000 wafers per year Dimension : 2,100L × 1,700H × 1,300W (mm3) Power : AC 600W (13.56MHz) Gas : H2/SiH4/PH3/B2H6 Heater : silicon carbide(heating rate: 40°C/min, max. temp : 850°C, deviation: negligible) Pump : rotary(600 l/min) & turbo(500... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea PECVD System for Solar Cell AR Coatings SiNx dielectric material coating SiOx dielectric material coating SiOxNy dielectric material coating Special Features Capacitively-Coupled PECVD system with loadlock chamber for R&D and small scale production. Automatic loadlock system with cassette. Uniform gas distribution through shower head. Specifications Substrate temperature uniformity :... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea PECVD System for Low Temp. CNTs Synthesis CNTs growth Special Features Small RF-PECVD system for CNT(Carbon Nano Tube) synthesis. Low temperature synthesis of CNTs(under about 400°C). Specifications Heating range : 400 ~ 600°C Average throughput : Up to 5,000 wafers per year Wafer capacity : 1 × 4" Dimension : 1,100L × 1,500H × 900W (mm3) Power : AC 100W (13.56MHz) Gas : NH3/C2H2/Ar/O2/N2 Heater : silicon carbide(heating rate: 40°C/min, max. temp.:850°C, deviation: negligible) Pump : rotary(600... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea PECVD System with High Density Plasma Optical waveguide Barrier layer Special Features SiO2 PECVD system for R&D and small scale production. Excellent thickness and reflective index uniformity in deposited layer (avg. 7µm). Highly smooth surface(RMS roughness of deposited layer : 30.6Å). Transformer coupled high density plasma. Specifications Wafer capacity : 1 × 4" Average throughput : Up to 5,000 wafers per year Dimension : 1,730L × 1,277H × 725W (mm3) Power : AC 1.2kW for TCP source(13.56MHz) AC 600W for bias voltage(13.56MHz) Gas : SiH4 / O2 Susceptor material : graphite Heater : silicon... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea ICP CVD system for Graphene and Boron Carbide Layers Graphene synthesis Special Features Multi-functional CVD system combined with ICP CVD and probe station. Maximum substrate temperature: 1,000°C. Automatic loading available during susceptor heating. High density plasma source. PC-control system. Specifications Wafer capacity : 6" wafer x 1 Average throughput: 4,800 wafer/year Dimension : 1,500W × 1,800D × 1,830H (mm3) Power : ICP Power supply Bias power supply Heater : Heating element - SiC coated graphite(max. temp.:1,200°C) Gas : Ar/CH4/H2/B2H2/C2H2/O2/N2/NH3 Pump : dry pump, turbo pump, booster... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea PECVD System for OLED Barrier Layers OLED barrier layers(ex. SiOx, SiNx, SiONx, etc) Special Features SiOx and SiNx rf-PECVD system for R&D and small scale production. Designed to be compatible with OLED cluster system. Transformer-coupled high density plasma source. System and process controlled automatically by PC. Specifications Substrate : 100x100mm2, 150x150mm2 glass Average throughput : Up to 5,000 substrates per year Dimension : 1,400L × 1,900H × 2,000W (mm3) Power : AC 3kW for TCP source(13.56MHz) AC 600W for bias(13.56MHz) Deposition gas : SiH4/NH3/N2/N2O/O2/He/H2 Chamber cleaning gas :... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea PECVD Made in Korea CVD Made in Korea Sputter Made in Korea Arc Discharge System for transparent electrode CNTs growth Special Features Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis. SWNT and MWNT synthesis. Specifications Carbon rod : ~12phi x 300mm Average throughput : Up to 10kg per year Dimension : 1000L x 1400H x 650W(mm3) Power : DC 2kW Gas : He/H2/Ar Pump : rotary(600... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea CNT Made in Korea Arc Discharge Made in Korea PVD Made in Korea Sputter Made in Korea Arc Discharge System for SWCNTs Production Lighly crystalline SWCNTs synthesis Special Features Arc discharge synthesis of high quality SWCNTs. Automatically controlled sequential process of electrode loading, discharge, CNTs synthesis and their recovery. Equipped with specially designed CNTs recovery chamber in main chamber. Catalyst loading into drilled anode. Cassette loading of anodes (up to 10ea). Specifications Anode dimension : 10~19mm(D) × 300 mm(L) Average throughput : 200g SWCNTs/day Dimension : 3,000L × 2,200H × 1,400W (mm3) Power : DC 2kW Gas : He/H2/Ar Pump : rotary(600... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea CNT Made in Korea Arc Made in Korea Discharge Made in Korea PVD Made in Korea Hybrid System with UBMS and Ion Guns Hard coating Tribological coating Optical coating Special Features Ion-assisted unbalanced magnetron sputtering system for DLC deposition. Highly charged partices with a high kinetic energy. High degree of flexibility for various substrate materials. Average throughput : Up to 720,000 pcs per year Specifications Loading capacity : 250 pcs/run (sample size:10phi x 20t) Dimension : 1,050L × 1,750H × 725W (mm3) Power : AC 2kW (10kHz) Gas source : benzene Heater : kanthal Pump : rotary(980 l/min) & turbo(1,500... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Ion beam Made in Korea Sputter Made in Korea Hybrid Made in Korea PVD Made in Korea Vacuum Arc System with 8 Arc Guns Hard materials coating(eg. CrN, TiN, TiAlN) Anti-corrosive coating(eg. ZrN) Special Features Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr). Pumping system equiped with mechanical booster and oil diffusion pumps. Automatically or manually controlled in substrate revolution and rotation. Batch type of substrate loading. Average throughput Up to 300,000 pcs per year. Specifications Dimension : 1,000L X 1,000H X 1,300W (mm3) Power : DC 200A/100V 8ea for arc DC 35A/1000V 1ea for heater DC 20A/1000V 1ea for bias Heater : molybdenum(heating rate: 30°C/min,... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Non-Filtered Arc Deposition Made in Korea PVD Made in Korea Sputter Made in Korea Evaporation System for Continuous Al Deposition Deposition of low melting point materials(ex, Al, Mg, etc.) Special Features Thermal evaporation with roll coating system for mass production. Continuous Al feeder system. Speedy deposition and throughput. Specifications Loading capacity : 5km per day Average throughput : 15,000km per year Dimension : 1,730L × 1,200H × 1,000W (mm3) Power : AC(1A, -10kV) for e-beam source Pump : rotary(900l/min) &... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Thermal Evaporation Made in Korea PVD Made in Korea Sputter Made in Korea Arc Discharge System with High Performance CNTs growth Special Features Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis. SWNT and MWNT synthesis. Average throughput Up to 10kg per year. Carbon rod : 6phi × 30 mm. Specifications Dimension : 800L × 1,000H × 600W (mm3) Power: DC 2kW Gas : He/H2/Ar Pump :... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Non-Filtered Arc Deposition Made in Korea PVD Made in Korea Sputter Made in Korea Evaporation System for Organic EL Device Dielectric materials in EL display device Special Features E-beam evaporation system for small scale organic EL device production. In-line processed with glove box. Side-sliding door type. Smooth surface(RMS roughness < 20 nm). Specifications Wafer capacity : 1 × 5" Average throughput Up to 5,000 wafers per year Dimension : 1,730L × 1,800H × 725W (mm3) Power : AC(1A, -10kV) for e-beam source Pump : rotary(1,000l/min) & cryo(650l/s) Substrate rotation (up to 50... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea E-Beam Thermal Evaporation Made in Korea PVD Made in Korea Sputter Made in Korea Vacuum Arc System with 11 Arc Guns Hard materials coating(eg. CrN, TiN, TiAlN) Anti-corrosive coating(eg. ZrN) Special Features Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr). Pumping system equiped with mechanical booster and oil diffusion pumps. Automatically or manually controlled in substrate revolution and rotation. Batch type of substrate loading. Average throughput Up to 3,000,000 pcs per year. Specifications Dimension : 1,200L X 1,100H X 2,400W (mm3) Power : DC 200A/100V 11ea for arc DC 35A/1000V 1ea for heater DC 10A/1000V 1ea for bias Heater : sheath heater(heating rate:... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Non-Filtered Arc Deposition Made in Korea PVD Made in Korea Sputter Made in Korea FVAS (Filtered Vacuum Arc Source) Hard coating, Ferromagnetic devices Special Features FVAS system for small scale production with 90 degree macro-particle filtering. Magnet array designed specially for arc stabilization. Constantly exhibits high ionization ratio. Average throughput Up to 5,000 per year. Specifications Wafer capacity : 1 X 4" Dimension : 1,030L × 1,650H × 725W (mm3) Power : DC 100V/10A for electromagnetic field DC 100W for arc discharge(automatically switchable) Gas : dependent on deposition process Pump : rotary(600 l/min) & turbo(300 l/s) or DP(1,200... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Filtered arc deposition Made in Korea PVD Made in Korea Sputter Made in Korea In-line Cathodic Vacuum Arc Deposition System Coatings for PDP electrode protection(eg. MgO etc.) Special Features In-line system with 4 arc guns for dielectric materials deposition on 70 inch glass(base pressure: 1 X 10-6 Torr). Equiped with mechanical, booster and cryogenic pumping system. Automatically controlled in substrate moving. Average throughput : Up to 30,000 sheets per year. Specifications Dimension : 3,000L X 2,000H X 1,000W (mm3) Power : 4 power supplies for arc deposition(DC 200A/100V ) 6 heaters for substrate heating(DC 35A/220V ) Heater : nichrome(heating rate: 50°C/min, max. temp.: 450°C, temp.... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Non-filtered cathodic arc deposition Made in Korea sputter Made in Korea PVD Made in Korea In-line Evaporation System for Large Area Deposition Optical coating applications Hard coatings on plastics Functional coating applications Special Features In-line electron beam evaporation system for a mass production with multiple beam sources. Automatic process control through PC interfacing. Carrier loading capability : 600 carriers/load, 2x27" sheets/carrier. Standard tact time: 60s/carrier. Specifications Sheet capacity : 5,000 × 27" per day Average throughput : Up to 1,500,000 sheets per year Dimension : 12,000L × 2,300H × 2,000W (mm3) Power : AC(1.5A, 10kV) for each e-beam source Pump : 5 rotary pumps (1,000... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Electron beam Evaporation Made in Korea Sputter Made in Korea PVD Made in Korea Ion Beam Sputter for Precision Optics X-ray mirror Neutron mirror Reflective optics for EUV lithography Special Features Ion beam sputtering system for precision optics. Layer deposition and deposited layer milling, sequentially processed, with two ion guns. Substrate rotation for uniform deposition. Automatic distance control between ion guns and substrate. Target rotated and linearly swept, for its uniform erosion. Multilayer deposition with a low surface roughness(normally controlled below ~4Å) Specifications Wafer capacity : 1 x 4" Dimension : 1,500L × 2,400H × 900W (mm3) Power : 2 sets of ion guns(DC... Read More Inquiry Now Machinery, Industrial Parts & Tools Made in Korea Ion beam sputter Made in Korea Sputter Made in Korea PVD Made in Korea << Prev12 3Next >> Go to Page