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CNTs growth
Special Features
Small RF-PECVD system for CNT(Carbon Nano Tube) synthesis.
Low temperature synthesis of CNTs(under about 400°C).
Specifications
Heating range : 400 ~ 600°C
Average throughput : Up to 5,000 wafers per year
Wafer capacity : 1 × 4"
Dimension : 1,100L × 1,500H × 900W (mm3)
Power : AC 100W
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Introduction
PUTTIST, 3-putt Killer. is focused on the putting distance not only for the direction. In 1.5M small space, you can train 10M.
Installation and Operation
1. Open the box and check your package first.
2. Remove the protection tape on the non-slip pad at the back of the PUTTIST.
3. Spread the PUTTIST and mat on the floor.
*For
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Hard coating, Ferromagnetic devices
Special Features
FVAS system for small scale production with 90 degree macro-particle filtering.
Magnet array designed specially for arc stabilization.
Constantly exhibits high ionization ratio.
Average throughput Up to 5,000 per year.
Specifications
Wafer capacity : 1 X 4"
Dimension : 1,030L ×
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Metal, ceramic, and alloy depositions for R&D in OLED fields.
Special Features
Cluster sputtering system for TCO deposition with two sputtering chambers and one glove box.
Robot transfer chamber between chambers and glove box.
Cassette loading type with glass holder.
Three tiltable 8" sputter guns and extra sputter gun ports in each
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Optical waveguide
Barrier layer
Special Features
SiO2 PECVD system for R&D and small scale production.
Excellent thickness and reflective index uniformity in deposited layer (avg. 7µm).
Highly smooth surface(RMS roughness of deposited layer : 30.6Ã…).
Transformer coupled high density plasma.
Specifications
Wafer capacity : 1 ×
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Touch Screen Panel manufacturing
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Feel the ball’s movement with our handmade putter made 100% of high precision CNC milled!
Designed for the weight to be precisely distributed to the toe and heel, the head’s shaking is minimized for precise putting and improved straightness.
In addition, manufactured precisely and meticulously without error of 1 mm using the high
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Coatings for PDP electrode protection(eg. MgO etc.)
Special Features
In-line system with 4 arc guns for dielectric materials deposition on 70 inch glass(base pressure: 1 X 10-6 Torr).
Equiped with mechanical, booster and cryogenic pumping system.
Automatically controlled in substrate moving.
Average throughput : Up to 30,000 sheets per
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We deal with various high-quality window films manufactured in Korea. We can supply all products, including glue tinted films, dyed films, sputtered films, ceramic films, IR films, and safety films. We supply them at low competitive prices by cutting the production costs based on long accumulated technology.
In particular, our ceramic film does
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Applicable to various R&D fields that sputter deposition of metals and ceramic materials is necessary.
Application areas: semiconductor, display, solar cell, biochips, new materials, nanomaterials, and sample preparations, etc.
Special Features
RF or DC magnetron sputter for multipurpose R&D.
RF to DC power supply easily changed without
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Graphene synthesis
Special Features
Multi-functional CVD system combined with ICP CVD and probe station.
Maximum substrate temperature: 1,000°C.
Automatic loading available during susceptor heating.
High density plasma source.
PC-control system.
Specifications
Wafer capacity : 6" wafer x 1
Average throughput: 4,800
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Touch Screen Panel manufacturing
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Feel the ball’s movement with our handmade putter made 100% of high precision CNC milled!
Designed for the weight to be precisely distributed to the toe and heel, the head’s shaking is minimized for precise putting and improved straightness.
In addition, manufactured precisely and meticulously without error of 1 mm using the high
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Optical coating applications
Hard coatings on plastics
Functional coating applications
Special Features
In-line electron beam evaporation system for a mass production with multiple beam sources.
Automatic process control through PC interfacing.
Carrier loading capability : 600 carriers/load, 2x27" sheets/carrier.
Standard tact time:
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Specifications
Dimension : 1645(L)X1043.5(H)X630(W) (mm3)
Wafer Size : 6 inch
Motor Moving : 5mm/min ~ 300mm/min
Accuracy : 100µm
Control : Touch Panel
Main Power : 220V, 3phase,
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Optical coatings
Hard coatings
Metal coatings
Polymer surface modifications
Coatings for flat panel display electorates
Special Features
In-line sputter system with 8ea linear sputter guns for R&D and a small-scale production.
Automatic process control through PLC interfacing.
Carrier loading capability : 2x24"
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OLED barrier layers(ex. SiOx, SiNx, SiONx, etc)
Special Features
SiOx and SiNx rf-PECVD system for R&D and small scale production.
Designed to be compatible with OLED cluster system.
Transformer-coupled high density plasma source.
System and process controlled automatically by PC.
Specifications
Substrate : 100x100mm2, 150x150mm2
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The Black Mamba Driver model developed with Rino Golf’s further improved technology and know-how, was designed under the motif of the Black Mamba snake head of Africa that is highly poisonous (70 times that of King Cobra) and the fastest (24 km/hour) in the world.
The black lips and threatening tongue of the Black Mamba make people recall
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X-ray mirror
Neutron mirror
Reflective optics for EUV lithography
Special Features
Ion beam sputtering system for precision optics.
Layer deposition and deposited layer milling, sequentially processed, with two ion guns.
Substrate rotation for uniform deposition.
Automatic distance control between ion guns and substrate.
Target rotated