-
Optical coatings
Hard coatings
Metal coatings
Polymer surface modifications
Coatings for flat panel display electorates
Special Features
In-line sputter system with 8ea linear sputter guns for R&D and a small-scale production.
Automatic process control through PLC interfacing.
Carrier loading capability : 2x24"
-
Specifications
Dimension : 1645(L)X1043.5(H)X630(W) (mm3)
Wafer Size : 6 inch
Motor Moving : 5mm/min ~ 300mm/min
Accuracy : 100µm
Control : Touch Panel
Main Power : 220V, 3phase,
-
OLED barrier layers(ex. SiOx, SiNx, SiONx, etc)
Special Features
SiOx and SiNx rf-PECVD system for R&D and small scale production.
Designed to be compatible with OLED cluster system.
Transformer-coupled high density plasma source.
System and process controlled automatically by PC.
Specifications
Substrate : 100x100mm2, 150x150mm2
-
The Black Mamba Driver model developed with Rino Golf’s further improved technology and know-how, was designed under the motif of the Black Mamba snake head of Africa that is highly poisonous (70 times that of King Cobra) and the fastest (24 km/hour) in the world.
The black lips and threatening tongue of the Black Mamba make people recall
-
X-ray mirror
Neutron mirror
Reflective optics for EUV lithography
Special Features
Ion beam sputtering system for precision optics.
Layer deposition and deposited layer milling, sequentially processed, with two ion guns.
Substrate rotation for uniform deposition.
Automatic distance control between ion guns and substrate.
Target rotated
-
Roll-to-roll sputter system for the flexible solar cell
The system apparatus for depositing the base electrode / TCO top layer of flexible solar cell.
This equipment which forms the base electrode of flexible solar cell is equipped with the plasma cathode that has the power density for the deposition process. The system is able to produce
-
Metal coating
Metal Nitride coating
Special Features
Arc ion plating system for a functional coating.
Low temperature coating is possible.
High deposition rate and ionization degree, good adhesion.
Easy process control and cost effective
Specifications
Chamber body : Ø800×H1200(Effective : Ø600×H1,000)
Heater : Mo Plate
-
CNTs growth
Special Features
Small DC arc discharge system for CNT(Carbon Nano Tube) synthesis.
SWNT and MWNT synthesis.
Specifications
Carbon rod : ~12phi x 300mm
Average throughput : Up to 10kg per year
Dimension : 1000L x 1400H x 650W(mm3)
Power : DC 2kW
Gas : He/H2/Ar
Pump : rotary(600
-
Introduction
PUTTIST, 3-putt Killer. is focused on the putting distance not only for the direction. You can train 45ft. in 5ft. small space.
Installation and Operation
1. Open the box and check your package first.
2. Remove the protection tape on the non-slip pad at the back of the PUTTIST.
3. Spread the PUTTIST and mat on the
-
Optical device
Optical wave guide
Passivation layer
Special Features
RF sputtering system for R&D and small scale production.
Excellent thickness uniformity and surface morphology in deposited layers.
Silicon and reactive silicon oxide deposition.
Automatically movable substrate holder.
Specifications
Wafer capacity : 1 x
-
Roll-to-roll sputter system for the window solar film
The system apparatus for depositing the high quality window solar film
The system, window film deposition installation, is used to screen the rays of the sun(infrared rays, ultraviolet rays etc) for the building and automotive in use and in a position to produce a single layer and multi
-
Plasma modifications and PECVD of injection mold surface for forming automobile plastic parts.
Low friction and wear-resistant applications using plama nitriding and DLC deposition to various types of metal products.
Special Features
Batch type of large area plasma treatment, plasma nitriding & PECVD system.
(chamber size: ID:2,100mm,
-
Hard coating
Tribological coating
Optical coating
Special Features
Ion-assisted unbalanced magnetron sputtering system for DLC deposition.
Highly charged partices with a high kinetic energy.
High degree of flexibility for various substrate materials.
Average throughput : Up to 720,000 pcs per year
Specifications
Loading capacity :
-
Introduction
PUTTIST, 3-putt Killer. is focused on the putting distance not only for the direction. In 1.5M small space, you can train 10M.
Installation and Operation
1. Open the box and check your package first.
2. Remove the protection tape on the non-slip pad at the back of the PUTTIST.
3. Spread the PUTTIST and mat on the floor.
*For
-
Optical device
Passivation layer
Constantan materials
Special Features
4x6" sputter system for R&D and small scale production.
Excellent thickness uniformity(below +-2.8% for the layer of 228.6 nm in thickness).
Highly smooth surface(RMS roughness of deposited layer: 25 Ã…).
RF/DC magnetron sputter.
Automatic loading system.
Average
-
Multi Roll-to-roll sputter system for the high transmittance ITO touch film
Multi Roll-to-Roll sputter apparatus for depositing the high transmittance ITO film
This system, which is for producing high transmittance ITO film, consist of the chamber for processing oxides such as SiO2, Nb2O5 and multi-chamber that makes it possible to deposit
-
nanowires (Si & doped Si)
nanotubes
Special Features
Multi-functional thermal CVD system for nanowire synthesis.
Combined with plasma treatment and probe station.
Maximum substrate temperature : 900°C.
Growth direction controllable
Automatic loading available during subsceptor heating.
High density plasma source for chamber
-
Hard materials coating(eg. CrN, TiN, TiAlN)
Anti-corrosive coating(eg. ZrN)
Special Features
Vacuum arc system for mass production(base pressure: 1 X 10-6 Torr).
Pumping system equiped with mechanical booster and oil diffusion pumps.
Automatically or manually controlled in substrate revolution and rotation.
Batch type of substrate
-
??????
2011/10/31
???
KSN
???
Sputter,Sputtering,Vacuum Evaporator,Vacuum Coating System,Used Sputter,Used Sputtering,Used Vacuum Evaporator,Used Vacuum Coating System
????
2318000 - 0100
??
AMS-0401D
?? ? ??
??
??
1
????
???
USA
???
CLIO
-
Diaphragm Metalligations
Special Features
Roll to Roll System for mass production.
PC control based on PLC.
Metal deposition on flexible film
Flexible film thickness: 2um
Speedy deposition and throughput
Loading capacity : 5km per day
Average throughput 1,800km per year
Specifications
Dimension : 2,714L x 3,393H x 2,008W